ASML expects its next-generation high-NA EUV lithography systems to reach high-volume manufacturing by late 2026. The company targets 90% fleet availability in the fourth quarter. This metric is critical for customers to utilize the multi-million dollar machines in full-scale production.
ASML announced the timeline at the Semicon Taiwan 2026 conference. Ten advanced systems are currently operational across four customer sites. Intel began using the technology in July to produce advanced processors. Additional systems are currently being installed at customer locations.